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Vol 196
Pages:
336
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RUS

Method of measurement of anisotropic electron velocity distribution function

Authors:
A. S. Mustafaev1
A. Yu. Grabovskii2
About authors
  • 1 — Saint Petersburg State Mining University
  • 2 — Saint Petersburg State Mining University
Date submitted:
2011-08-19
Date accepted:
2011-10-04
Date published:
2012-05-22

Abstract

The method  of local anisotropic plasma has been  developed. The mathematical apparatus  of the method for rapid analysis of the  degree  of anisotropy  electron  distribution  function,  as one of the main characteristics of anisotropic plasma has been proposed. It has been  demonstrated that the degree of anisotropy of the plasma can be determined only by the form of the IU  curve (the second derivative of probe current to the probe potential). The possibilities of the method in area of reconstruction of the  full  distribution  function have been illustrated.

Мустафаев А.С., Грабовский А.Ю. Метод измерения анизотропной функции распределения электронов по скоростям // Записки Горного института. 2012. Т. 196. С. 336.
Mustafaev A.S., Grabovskii A.Y. Method of measurement of anisotropic electron velocity distribution function // Journal of Mining Institute. 2012. Vol. 196. p. 336.
Go to volume 196

References

  1. Каган Ю.М. Зондовые методы исследования плазмы / Ю.М.Каган, В.И.Перель // Успехи физических наук. 1963. Т.81.
  2. Лапшин В.Ф. Метод плоского одностороннего зонда для диагностики анизотропной плазмы / В.Ф.Лапшин, А.С.Мустафаев // Журнал технической физики. 1989. Т.59. № 2.
  3. Федоров В.Л. К вопросу об определении ФРЭ по скоростям в аксиально-симметричной плазме / В.Л.Федоров, А.П.Мезенцев // Журнал технической физики. 1987. Т.57. № 3.
  4. Godyak V.A. Plasma-Surface interaction and processing of materials. Deventer: Kluwer, 1990.
  5. Demidov V.I., Kolokolov N.B., Kudryavtsev A.A. Probe methods for low-temperature plasma investigation. Moscow, 1996.
  6. Pfau S., Tichy M. Low temperature plasmas: fundamentals, technologies and techniques / Ed. by R.Hippler. Berlin, 2008.
  7. Lieberman M. Plasma processing for nanoelectronics // 63rd gaseous electronics conference & 7th international conference on reactive plasmas: Contr. Pap., 2010. Paris, France, 2010. Vol.55. N 37.

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