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A. B. Fedortsov
A. B. Fedortsov
Saint-Petersburg Mining University
Saint-Petersburg Mining University

Co-authors

Articles

Metallurgy and concentration
  • Date submitted
    2018-01-02
  • Date accepted
    2018-03-08
  • Date published
    2018-06-25

Noncontact laser control of electric-physical parameters of semiconductor layers

Article preview

Non-contact non-destructive laser-interferometric methods for measuring several electrophysical parameters of semiconductor and dielectric layers are proposed. They are the lifetime of charge carriers for electrons and holes separately; parameters of recombination centers, namely their concentration and capture cross-sections; bulk volume lifetime and rate of surface recombination, as well as the diffusion length of charge carriers. The methods are based on the interference-absorption interaction in a semiconductor of two laser radiations with different wavelengths. Short-wave injection radiation generates additional charge carriers in the material, which leads to a change in its optical constants at the wavelength of the other – long-wavelength probing laser radiation – and to modulation of this radiation as it passes through the sample of the studied material. The means for implementing the proposed methods and methods for processing the modulation signal for determining the parameters of the investigated samples are developed. The methods have been successfully tested on samples of such materials as germanium, silicon, indium antimonide and cadmium-mercury-tellurium alloy. It is shown that the methods can be used both in scientific research and electronic industry.

How to cite: Fedortsov A.B., Ivanov A.S. Noncontact laser control of electric-physical parameters of semiconductor layers // Journal of Mining Institute. 2018. Vol. 231. p. 299. DOI: 10.25515/PMI.2018.3.299
Geo-nanomaterials
  • Date submitted
    2015-08-20
  • Date accepted
    2015-10-17
  • Date published
    2016-02-01

Increasing the accuracy of the fast laser measurments transparent solid and liquid films thicknesses

Article preview

Nondestructive optical methods for measuring of the «thick» films thickness of the order of 0,001-1,00 mm are analyzed. It is shown that using the laser beam radiation and modern optical and electronic schemes possible to decrease the time of single measurement to 1ms and less at the measuring frequency of 10-50 Hz. The possibility of measuring thickness and spreading coefficient and evaporation kinetics of liquid films is demonstrated. A new computer method of the data processing aimed to determine the film thickness from the angle dependence of the laser beam reflection coefficient by the film is offered. The offered procedure and the experimental technique realizing it permits to decrease the thickness determination uncertainty to the order of ten.

How to cite: Fedortsov A.B. Increasing the accuracy of the fast laser measurments transparent solid and liquid films thicknesses // Journal of Mining Institute. 2016. Vol. 218. p. 306.