A comparative analysis of the plasma-chemical process in high- and low-pressure glow discharges is presented. Processes that determine parameters of glow discharges have been determined basing on numerical simulation results. Correlations between spatial distribution of the main glow discharge characteristics and distribution of the main plasma chemical processes are presented.
The simple model which allows to make volt-ampere characteristic for the obstructed negative glows, considering non-local ionization in negative glow is developed. Scaling relationship which allow to predict key parameters obstructed glow discharges are received. The basic expressions for calculation of distribution of electrons density along a gap in plasma of a negative glow, distribution of potential and intensity of an electric field (including a point of the electric field reversal) are also presented. Comparison of the received results with data of full-scale modeling has shown the satisfactory consent. Carrying out of preliminary estimations by means of the presented model based on reliable physical principles, allows formulate better a problem for full-scale modeling.
